A novel planarization method based on photoinduced confined chemical etching.
نویسندگان
چکیده
A photoinduced confined chemical etching system based on TiO2 nanotube arrays is developed for the planarization of the copper surface, which is proved to be a prospective stress-free chemical planarization method for metals and semiconductors.
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ورودعنوان ژورنال:
- Chemical communications
دوره 49 57 شماره
صفحات -
تاریخ انتشار 2013